Compact Plasma Cleaning System - The Apollo

The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo plasma cleaning system is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF bias power as needed, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate the SST-Lightning microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.

Specifications

Etch rates up to 6ìm/min

100mm to 300mm wafers

High throughput

Small footprint

Low plasma damage

Competitively priced

Self-tuning

Applications

MEMS

Compound Semiconductor

Pilot Line Production.