Vistec SB254: High Performance Electron-Beam Lithography
Vistec’s SB254 is a fully automated, high performance, cost-effective electron-beam lithogr……...

TheAccuSizer Mini system features a modular design, enabling users to tailor sensors and fluidics options to match the characteristics of customer slurries and process equipment. The systems deliver rapid and high-resolution results with count rates surpassing those of alternative technologies, ensuring superior accuracy.
This enhancement in statistics is crucial for detecting large particle counts (LPC) that may otherwise impact yields or product quality.
An array of customized autodilution modules ensures precise concentration delivery to the sensor for accurate measurements.
Utilizing the single particle optical sizing (SPOS) technique, a selection of sensors operating within focused size ranges and concentration limits yields the utmost accuracy in results.
Employ this system for ongoing monitoring of LPCin the Chemical Mechanical Planarization (CMP) slurry delivery system and leverage it as a tool to optimize filtration and other process conditions.
AccuSizer Mini FX System
0.65 to 20 µm, with a capacity of up to 106 particles/mL
Optimal for ceria CMP slurries
Utilizes a single-stage dilution fluidics system
AccuSizer Mini LE System
Range: 0.5 to 400 µm, up to 9,000 particles/mL
Ideal for silica CMP slurries
Single or dual-stage dilution fluidics
AccuSizer Mini FLEX System
Choose between LE or FX sensors
Well-suited for various sample types
Utilizes dynamic single-stage dilution fluidics
AccuSizer Mini FX-Nano System
Range: 0.15 to 10 µm, with a capacity of up to 106 particles/mL
Well-suited for clean, colloidal CMP slurries
Utilizes exponential dilution fluidics
Vistec’s SB254 is a fully automated, high performance, cost-effective electron-beam lithogr……...
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