SC 1500 Inline Sputtering System from Semicore

The SC 1500 inline sputtering system offers a modular, cost-effective and scalable design to satisfy the requirements of high-volume or pilot production. Load locks with multiple pallet handling for continuous tip to tail processing enable target utilization and optimal throughput.

Key Features

The key features of the SC1500 inline sputtering system are:

Can process a number of size and shape substrates without costly retooling

Linear magnetron cathodes are provided for single or dual-sided sputter deposition

RF, DC, pulse DC sputtering capability

Reactive sputtering is possible

RF substrate etch/pre-cleaning

Cryogenic or turbo high vacuum pump packages

HMI “Human Machine Interface” includes recipe control, data logging, historical trending, tolerance checking, user level access, SECS/GEM interface