Reactive Ion Etch System - Phantom III

The Phantom III RIE (reactive ion etch system) is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

Applications

Processes have been developed for either isotropic or anisotropic etching of silicon dioxide, silicon nitride and other materials requiring fluorinated or any non-toxic, non-corrosive chemistries. The Phantom III comes with full process support both prior to and subsequent to purchase.

Tool Features

ReactorThe cathode and anode are each machined out of single blocks of aluminum. After critical inspection they are hard anodized for protection from process chemistries. The bottom electrode is available in either 200mm or 300mm sizes and can process single wafers, dies or parts (2" - 300mm). Process gases are introduced into the chamber either by an annular ring or a showerhead manifold.

Automatic Matching NetworkThe uniquely designed network is built in as an integral part of the bottom electrode assembly to ensure accurate tuning, low transmission loss and virtually no RF radiation outside the network itself. The network uses a phase magnitude sensor and amplifiers to provide instantaneous feedback for quick precise tuning.

RF GeneratorThe system comes with a 600 watt, 13.56 MHz, solid state RF generator.

Touch Screen Operator InterfaceA color flat panel display with touch screen interface provides the operator with full process information at all times. The software interface guides the operator through each sequence in a logical fashion and gives fingertip control of all process parameters.

PC Process ControllerThe PC process controller provides simple and reliable system control. The graphical software package creates programs in block diagram form. Process recipes are stored on the hard drive or can be stored on USB flash drives allowing each operator to maintain individual recipes.

AC Distribution ModuleThe AC distribution module automatically distributes predefined power quantities to the various internal components. When the Emergency Power Off button is tripped, the RF power is shut off and all valves involved with gas delivery are automatically closed and the machine powers down to a safe standby mode. This system includes separate power controls for the main AC and peripherals.

Automatic Pressure ControlEvery Trion system includes a butterfly pressure control valve operated directly by the process controller. This provides independent pressure control separate from all other processing parameters.

Gas Delivery SystemState-of-the-art technology is utilized to ensure the utmost integrity and purity. Each reaction chamber accommodates two mass flow controllers and all plumbing utilizes surface mount, C-seal technology or orbital welded VCR fittings.

SafetyThe system meets SEMI S2-93 safety requirements. The system is CE compliant with Machinery Directive 98/37/EC, the Low Voltage Directive 73/23/EEC and the Electromagnetic Compatibility Directive 89/336/EEC for CE Marking requirements. A third party safety review is available upon request.