Plasma Measurements Made Easy with the PSM

Plasma probes from Hiden measure several important plasma parameters and provide thorough information on plasma reaction chemistry.

Applications

Residual gas analysis

Reactive ion etching

Plasma electrode coupling

Plasma deposition studies

Laser ablation

Ion implantation

Leak identification

Overview

Electrical plasmas are used in various industrial processes, and potential applications are emerging constantly. Higher yields and smaller device geometries in the microelectronics sector necessitate process reproducibility and knowledge.

The development of sophisticated surface engineering procedures like HIPIMS requires a thorough understanding of the reaction kinetics of plasma ions and neutral species.

Features

Pulse ion counting detector with seven decade dynamic range

High sensitivity/stability triple filter quadrupole, mass range options to 510 amu

Differentially pumped manifold with mounting flange to process chamber

Ion extraction/exclusion optics with tunable integral ionizer for Appearance Potential MS

Energy analysis option by pole bias scanning 100 eV

Time-resolved research in pulsed plasma with signal gating and configurable signal gating

Mu-Metal, Radio-metal shielding options, high pressure operation options

MASsoft control through RS232, RS485or Ethernet LAN

Analysis of neutrals and radicals as standard, +ve /−ve ion analysis option

Penning gauge and interlocks provide overpressure protection