Compact excavator from Komatsu Ltd.
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美国TERA-print
在 TERA-print，我们将桌面纳米制造工具和技术商业化，使不同背景的研究人员能够以前所未有的方式进行纳米制造。TERA-Fab E 系列是一种多功能光刻技术，能够实时遍历纳米、微米和宏观尺度，同时还配备数字光掩模平台（无需物理掩模），并且广泛兼容软硬材料。TERA-Fab 技术已在推动用户在关键领域的研究，包括微流体、生物和电化学传感、微阵列图案化以及设备原型设计。
使能技术 | 光束笔光刻
光束笔光刻 (BPL) 是一种无悬臂扫描探针光刻技术，由西北大学的 Chad Mirkin 博士发明。该方法将先进的紫外投影系统与专有的 BPL 阵列相结合，允许多达 100,000 个可独立寻址的探针进行无掩模光刻。 BPL阵列最终控制可实现的特征尺寸，范围从亚250纳米到1微米。TERA-Fab还可以在无掩模投影模式下使用（无BPL阵列），适用于需要特征分辨率>1.5微米的应用，例如微流体模具或MEMs器件。
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