X’Pert³ MRD

The X’Pert³ MRD X-Ray diffractometer available from PANalytical has been developed to meet the needs of current materials research and development laboratories. The X’Pert³ MRD is the one of the most flexible systems available for X-ray diffraction studies and can be used in metrologic characterization in semiconductor process development as well as in sophisticated materials science and nanotechnology.

The X’Pert³ MRD is suitable for thin film analysis applications.

Key Features

The main features of X’Pert³ MRD are:

Can accommodate semiconductor wafers up to 200mm diameter

Can fully map wafers up to 100mm

Comes with a wide range of sample holders

Multiple samples can be mounted on the large sample platform

An extended version enables mounting of a high-resolution monochromator and an X-ray mirror, increasing the intensity of the incident beam

In-plane diffraction to measure diffraction from lattice planes perpendicular to the sample surface

Applications

The applications of X’Pert³ MRD are:

Reflectometry and thin film phase analysis

Rocking curve analysis and reciprocal space mapping

Residual stress and texture analysis