VOYAGER: The electron beam lithography system for results at the push of a button

The VOYAGER is a high-performance electron beam lithography system that has been specifically developed and is appropriate wherever direct access to electron beam lithography in multi-user facilities is needed.

The entirely automated and ultra-ergonomic system together with smart features and original system architecture guaruntees the shortest time to result. This makes it perfect for both academic and industrial surroundings.

With features including:

Stitching-error-free continuous writing modestraxxandperiodixx,based on moving stage technology

50 kV thermal field emission column technology

Highly ergonomic human-machine interfaceErgoFlow

Unique formula-based patterning technologyalgorithmixx

Flexible directional shape-filling modesFLEXposure

Automatic focus and stigmator setup

Automatic switch between high-resolution and high-throughput writing modes

Fully automated write field calibration

VOYAGER stands for user-friendliness, innovationand stable high performance all at an affordable price/performance ratio throughout the lifetime of the instrument. The VOYAGER electron beam lithography system comes with an environment-tolerant shield that ensures system stability even in less-perfect laboratory surroundings.

EBL at the push of a buttonPlay

Video Credit: Raith

Ergonomic Interface and Automated EBL for Shortest Time to Result

VOYAGER makes use of Raith’s eWrite technology. eWrite integrates faithful EBL electron optics along with the new innovations in pattern generator design that makes automated system calibrations and batch fabrication possible.

All corrections that are required throughout the complete exposure job are applied pixel by pixel and “on the fly.” This helps save huge process time overheads. Depending on the pattern, writing speeds of more than 1 cm²/hour could be obtained at the highest resolution.

Furthermore, the degree of automation goes one step further thanks to thenew ergonomic human–machine interface known as ErgoFlow. Making use of this smart workflow, professional lithography becomes more accessible to everyone—no matter their level of expertise.

ErgoFlow complements the widely used Raith Nanosuite standard software and comprises two elements.

In the initial step, it is possible for any user to easily specify an EBL job. This has to be additionally parameterized and executed in the second step by a experienced user. With the help of VOYAGER’s unique sample leveling system, even manual leveling, and pre-alignment are automatically regulated. This helps save time and considerably increases efficiency.

ErgoFlow is easy to useand could also leverage interdisciplinary research and sample exchange even between diverse university faculties or industrial departments.

With its innovative architecture VOYAGER allows for a cost-effective “through-the-wall-loading” setup of the e-beam writer. Image Credit: Raith GmbH

Features

Stitching and Overlay

≤ 20 nm

Beam Current Stability

≤ +/− 0.2%/hour

Guaranteed Minimum Linewidth

≤ 8 nm

A High-Performance Electron Beam Lithography System with Innovative Architecture and Unique Application Solutions

Both software and hardware have been developed for automated exposure operations. Special software features like the new formula-based patterning technology algorithmixx and the constant-moving-stage-based writing modes traxx and periodixx help users increase their efficiency and perfect device performance.

Applications utilized in the fields of photonics, optics, and optoelectronics benefit from the software solutions that are available. It is possible to

Tune grating pitch in the 10 pm regime

Regulate extremely large design data sets in an efficient manner

Losses can be decreased in tapered waveguides

Applications

Metalens structure using efficient formula based patterning. Image Credit: Raith

150 nm gate in PMMA (bi-layer). Image Credit: Raith

Freestanding multi-terminal graphene device. Image Creadit: M. Kühne, MPI Stuttgart, Germany.

Center of a 1x1 cm² fresnel lense in SU-8 written in 53 minutes. Image Credit: Raith

Stitching-error-free high-performance tapered waveguides, several mm in length. Image Credit: Raith

1x1 cm² grating in ZEP520a in less than 2 hours. Image Credit: Raith

Micro gear pump. Image Credit: Raith

Photonic crystal waveguide in ZEP520a. Image Credit: Thomas Krauss, University of York, UK

Sub-7 nm lines in HSQ. Image Credit: Raith

Service

Clear drivers of decision-making are system performance and specifications parameters where EBL systems are considered. However, there is a need for several factors to be taken into account if efficient operation, reliable support, and continuous uptime are to be ensured over the lifetime of the instrument system.

Using a global team of professional service engineers, Raith Service ensures users can make the ideal use of their system. When users decideon a Raith system, all site surveys jointly with surrounding measurements, the resultant factory, cleanroom laboratory setup, and on-site training are involved.

Moreover, application aids are available free of charge in all worldwide time zones.

Raith service contracts track a modular scheme and could be configured to match users’ separate budgets and needs.

Image Credit: Raith