VOYAGER: High Performance Electron Beam Lithography

The VOYAGER is a steadfast high-performance electron beam lithography system. It is particularly appropriate wherever direct access to electron beam lithography in multi-user facilities is required.

The completely automated and ultra-ergonomic system with smart features and original system architecture guarantees the shortest time to result, thereby making it ideal for both industrial and academic surroundings.

With features including:

Greatly ergonomic human-machine interface ErgoFlow

Adaptable directional shape-filling modes FLEXposure

Special formula-based patterning technology algorithmixx

50 kV thermal field emission column technology

Stitching-error-free constant writing modes traxx and periodixx, depending on moving stage technology

Completely automated write field calibration

Automatic switch between high-throughput and high-resolution writing modes

Automatic focus and stigmator setup

VOYAGER refers to innovation, user-friendlinessand stable high performance all at an attractive cost/performance ratio across the instrument’s lifetime. The VOYAGER electron beam lithography system is available with an environment-tolerant shield guaranteeing system stability even in less-perfect laboratory surroundings.

EBL at the push of a buttonPlay

Video Credit: Raith

Ergonomic Interface and Automated EBL for Shortest Time to Result

VOYAGER integrates Raith’s eWrite technology. eWrite integrates devoted EBL electron optics with the new innovations in pattern generator design that tend to automate system calibrations and batch fabrication.

All needed corrections across the full exposure job are employed pixel by pixel and “on the fly,” thus saving huge process time overheads. Based on the pattern, writing speeds of over 1 cm²/hour can be achieved at the highest resolution.

Also, the degree of automation goes a step further with the new ergonomic human–machine interface called ErgoFlow. Using this smart workflow, professional lithography becomesaccessible to everyone — irrespective of their level of expertise. ErgoFlow complements the extensively utilized Raith Nanosuite standard software and contains two elements.

In the first step, any user can easily specify an EBL job, which is further parameterized and performed in the second step by an experienced user. With VOYAGER’s special sample leveling system, uniform manual leveling and prealignment are managed in an automatic manner, thereby saving time and considerably increasing user efficiency.

As a result of its easy usability, ErgoFlow could also leverage sample exchange and interdisciplinary research even between different industrial departments or university faculties.

With its innovative architecture VOYAGER allows for a cost-effective “through-the-wall-loading” setup of the e-beam writer. Image Credit: Raith

Features

Stitching and Overlay

≤ 20 nm

Beam Current Stability

≤ +/− 0.2%/hour

Guaranteed Minimum Linewidth

≤ 8 nm

A High-Performance Electron Beam Lithography System with Innovative Architecture and Unique Application Solutions

Both software and hardware have been constantly developed for automated exposure operations. Special software features like the new formula-based patterning technology algorithmixx and the constant-moving-stage-based writing modes traxx and periodixx help increase the efficiency ofdevice performance.

The fields of optics, photonics, and optoelectronics benefit from the available software solutions.

Users can:

Reduce losses in tapered waveguides

Tune users’ grating pitch in the 10 pm regime

Effectively control extremely large design data sets

Applications

Metalens structure using efficient formula based patterning. Image Credit: Raith

150 nm gate in PMMA (bi-layer). Image Credit: Raith

Freestanding multi-terminal graphene device. Image Creadit: M. Kühne, MPI Stuttgart, Germany.

Center of a 1x1 cm² fresnel lense in SU-8 written in 53 minutes. Image Credit: Raith

Stitching-error-free high-performance tapered waveguides, several mm in length. Image Credit: Raith

1x1 cm² grating in ZEP520a in less than 2 hours. Image Credit: Raith

Micro gear pump. Image Credit: Raith

Photonic crystal waveguide in ZEP520a. Image Credit: Thomas Krauss, University of York, UK

Sub-7 nm lines in HSQ. Image Credit: Raith

Service

System performance and specifications parameters are clear drivers of decision-making where EBL systems are taken into account. But there is a need for more factors to be taken into consideration if continuous uptime, efficient operation, and reliable support are to be guaranteed over the lifetime of the instrument system.

With the help of a worldwide team of professional service engineers, Raith Service guarantees users can make the perfect use of their system. When users make a decision on a Raith system, all site surveys collectively with environmental measurements, aid with the consequent cleanroom laboratory setup, factory, and on-site acceptances.

Extensive on-site training is always provided. Furthermore, application assistance is available free of cost in all global time zones.

Raith service contracts follow a modular scheme and can be configured to match individual requirements and budgets.

Image Credit: Raith