XRD for Structural Analysis of Small Molecules - XtaLAB Synergy-i
The XtaLAB Synergy-i single crystal X-ray diffractometer includes a high-flux, low maintenance mi……...
Efficiently monitor both established and new contaminants across various molecular categories with high sensitivity, precision, and reliability.
Traditional Airborne Molecular Contaminant (AMC) monitoring solutions often require multiple sensors to comprehensively monitor the required range of compounds. TOFWERK Semicon AMC Monitors, however,offer asingle-solution approach that enablesrobust and simultaneousmeasurement of various AMC categories.
Real-Time Monitoring
Recognize and promptly respond to early-stage contamination events.
Robust Coverage
Simultaneous, ultra-fast measurements of acids, bases, condensables, and volatile organic compounds (VOCs).
Image Credit: TOFWERK
Single-Digit, Part-Per-Trillion LODs
Sensitive detection for the lowest concentrations.
Source: TOFWERK
AMC | CAS | Molecule | 2s LOD (ppbv) | 1 min LOD (ppbv) |
---|---|---|---|---|
Propylene glycol methylether acetate (PGMEA) | 108-65-6 | C6H12O3 | 0.0065 | 0.0012 |
Propylene glycol methyl ether (PGME) | 107-98-2 | C4H10O2 | 0.052 | 0.0094 |
Methyl Ethyl Ketone (MEK) | 78-93-3 | C4H8O | 0.421 | 0.075 |
Ethyl Acetate (EA) | 141-78-6 | C4H8O2 | 0.104 | 0.019 |
Cyclopentane | 287-92-3 | C5H10 | 0.132 | 0.023 |
Acetone | 67-64-1 | C3H6O | 0.002 | 0.0009 |
Toluene | 108-88-3 | C7H8 | 0.012 | 0.003 |
Ammonia | 7664-41-7 | NH3 | 0.408 | 0.072 |
Hydrogen fluoride | 7664-39-3 | HF | 0.011 | 0.0002 |
Hydrochloric acid | 132228-87-6 | HCl | 0.526 | 0.095 |
Nitric acid | 7697-37-2 | HNO3 | 0.0072 | 0.0013 |
Chlorine | 7782-50-5 | Cl2 | 0.001 | 0.0002 |
Comprehensive Contamination Control Throughout the Fab.
FOUP Monitoring
One of the biggest contamination risks in the fab is during the transportation of Front Opening Unified Pods from one process to the next. The sensitivity, speed, and coverage of AMC screening set a limit on FOUP cleanup.
Image Credit: TOFWERK
Facility Monitoring
Semiconductor manufacturing consists of many independent processes. Sensitive AMC monitoring is a critical component of the fab infrastructure, particularly when it comes tocatching early-stage contamination events.
Image Credit: TOFWERK
Mobile Analysis
Semicon AMC Monitors are uniquely versatile and designed for easy integration across various fab settings. They enable in-situ mobile measurements for accurate AMC control and effective leak detection, particularly for sticky and reactive substances.
Image Credit: TOFWERK
Immediate Hazard Detection
Material Off-Gassing in an ISO 5 Microtechnology Cleanroom
The material underwent a purge with Clean Dry Air (CDA) and was measured directly. Each time series shows simultaneous compound measurements with three different ionization chemistries.
Image Credit: TOFWERK
A toluene and ammonia leak was identified in an ISO 5 fine chemical cleanroom.
Image Credit: TOFWERK
Features
A full toolkit for efficient AMC management.
Real-Time Monitoring
Quickly detect and react to early-stage contamination events.
Fabs host hundreds of processes that can produce unwanted contaminants. When there is a leak or process failure, live and fast AMC reporting helps manufacturers respond quicklyto and resolve contamination events.
Part-Per-Trillion Detection Limits
Extremely sensitive, ensuring that no signal is missed.
As the technology node continues to decrease, the impact trace AMCs have on production yield is amplified. Monitoring systems that do not achieve part-per-trillion detection levels are deemed insufficient when it comes to offering effective protection against contamination incidents.
Robust Coverage
Simultaneously measure Acids, Bases, Condensables, and VOCs.
AMCs are composed of a variety of molecular classes. Conventional technologies are unable to measure all relevant categories and often require a suite of instrumentation to provide adequate coverage. Semicon AMC Solutions, on the other hand, canprovide comprehensive, real-time coverage for the molecular classes that pose a critical risk to semiconductor manufacturing processes.
Flexible Configurations
A solution for every application.
Semicon AMC Monitors can be specifically tailored to meet any application requirements, whether it is for monitoring fabrication process chemical leaks, assessing Front Opening Unified Pods (FOUPs) for quality control, or performing mobile facility analyses.
Customizable Target Lists
Evolves with your interests.
Monitor all criticalAMCsand then continuously expand the scope to include additional ones as needed.
Retrospective Data Review
Thorough data inventory for future proof analysis.
Access to historical mass spectrum measurements is readily available. Review past incidents as new AMCs become of interest.
Specifications and Limits of Detection
TOFWERK Semicon AMC monitors are available in two versions that can be used separately or in tandem. Accessories are available for use in a variety of AMC monitoring applications.
ABC Configuration
The optimal solution for simultaneous monitoring of Acids, Bases, Condensables, and certain VOCs is provided by TOFWERK's patented fast polarity switching and Aim Reactor technology. This allows for the concurrent reporting of each compound class in the millisecond timescale, with minimal fragmentation.
ABC LODs (pptv 1 minute) for representative compounds. Source: TOFWERK
Substance | Formula | LOD (pptv 1 min) |
---|---|---|
Hydrofluoric acid | HF | 10 |
Nitric acid | HNO₃ | 5 |
Acetic acid | HCOOH | 10 |
Ammonia | NH₃ | 10 |
Dimethylamine (DMA) | (CH₃)₂NH | 5 |
Propylene glycol methyl ether acetate (PGMEA) | C6H12O3 | 5 |
Toluene | C7H8 | 5 |
VOC Configuration
TOFWERK's VOC configuration provides comprehensive monitoring for Volatile Organic Compounds. Compared to the ABC Configuration, the VOC configuration provides more robust measurements of VOCs using PTR mass spectrometry with pptV limits of detection.
VOC LODs (pptv 1 minute) for representative compounds. Source: TOFWERK
Substance | Formula | LOD (pptv 1 min) |
---|---|---|
Benzene | C6H6 | 6.1 |
Isopropyl alcohol (IPA) | C3H8O | 9.6 |
Propylene glycol methyl ether acetate (PGMEA) | C6H12O3 | 13.1 |
Ethyl acetate (EA) | C4H8O2 | 11.4 |
Propylene glycol methyl ether (PGME) | C4H10O2 | 13 |
Cyclopentane | C5H10 | 10 |
System Specifications
Source: TOFWERK
. | . |
---|---|
Library | User Defined |
Concentration Range | ppqv-100 ppbv |
Resolution | >1000 M/ΔM |
Limits of Detection | 1-50 pptv |
Analysis Cycle | 40 kHz |
Mode Switching | 5 Hz |
Operating Temperature | 10-40 °C |
Operating Humidity | <90% |
Certification | CE |
Limits of Detection
Source: TOFWERK
AMC | CAS | Molecule | 2s LOD (ppbv) | 1 min LOD (ppbv) |
---|---|---|---|---|
Propylene glycol methylether acetate (PGMEA) | 108-65-6 | C6H12O3 | 0.0065 | 0.0012 |
Propylene glycol methyl ether (PGME) | 107-98-2 | C4H10O2 | 0.052 | 0.0094 |
Methyl Ethyl Ketone (MEK) | 78-93-3 | C4H8O | 0.421 | 0.075 |
Ethyl Acetate (EA) | 141-78-6 | C4H8O2 | 0.104 | 0.019 |
Cyclopentane | 287-92-3 | C5H10 | 0.132 | 0.023 |
Acetone | 67-64-1 | C3H6O | 0.002 | 0.0009 |
Toluene | 108-88-3 | C7H8 | 0.012 | 0.003 |
Ammonia | 7664-41-7 | NH3 | 0.408 | 0.072 |
Hydrogen fluoride | 7664-39-3 | HF | 0.011 | 0.0002 |
Hydrochloric acid | 132228-87-6 | HCl | 0.526 | 0.095 |
Nitric acid | 7697-37-2 | HNO3 | 0.0072 | 0.0013 |
Chlorine | 7782-50-5 | Cl2 | 0.001 | 0.0002 |
The XtaLAB Synergy-i single crystal X-ray diffractometer includes a high-flux, low maintenance mi……...
The Institute for Micromanufacturing (IfM) is a state-of-the-art high technology research and dev……...
/9-9-I-9M-9M-9-9A-9-9G-9G-9E-1/ Cead是大规模复合添加剂制造业边界上3D打印设备的技术供应商。 201……...
Focused on continuous cast iron bar products and comprised of two business units. Dura-Bar is the……...
Stewart EFI 是精密、深冲、级进模和滑动成型金属冲压件、线材成型件以及自动化和二次组件、电镀和金属……...
ULVAC(ULtimate in VACuum)成立于1952年,自成立以来一直致力于真空处理技术的进步。作为一家国际化……...
Item North America is a premier provider of precision ball screws for use as a drive mechanism in linear slides, multi-axis motion and complex material handling devices. item ball screws feature hi……
SurPASS™ 3 is capable of measuring the zeta potential over an extensive range of materials and allows the analysis of varied surface properties and their changes. The zeta potential explains ……
AHP Materials is a specialty materials company focused on the manufacturing and selling of high purity specialty metals and compounds. AHP concentrates mainly on Antimony, Cadmium Sulfide, Telluriu……