Ultimate Performances at Ultra-High Vacuum: UHV FIB-SEM NanoSpace

TESCAN's NanoSpace is a user-friendly, multipurpose system particularly developed to work under Ultra-High Vacuum (UHV) conditions.

The NanoSpace system can be configured either as a scanning electron microscope (SEM) or as a dual-beam platform that integrates a high-performance Focused Ion Beam (FIB) and aSEM.

The UHV instrument has a modular design that enables a wide range of FIB and SEM columns corresponding with the particular requirements and goals of end-users. It also provides the most optimal, complete, and tailored solution for surface analysis and FIB nano-machining on specimens requiring the most stringent contamination-free environment.

The NanoSpace can even be fitted with a UHV-compatible Gas Injection System (GIS) for selective etching and local metal deposition.

In-situ connection to third-party systems, like surface analysis instruments and MBE clusters, is also feasible via a UHV intermediate chamber. This connectivity extends the application scope of the NanoSpace instrument.

Key Benefits

Fully customizable system

Full UHV design—contamination-free environment

Developed to conduct high-quality surface analysis

Precise sample control

High-resolution imaging

UHV connection is available

Completely automated instrument