Ultim Extreme for Ultra-High-Resolution SEM

The Ultim® Extreme offers best spatial resolution and low-energy performance for EDS in the SEM. Integration of Extreme electronics and windowless construction with optimized geometry and sensor design offers up to 15x greater sensitivity when compared to a traditional large-area SDD.

Work at energies below 2 kV todeliver sub-10 nm spatial resolution in bulk samples Detection and mapping of Li X-rays

Combine with immersion optics to gather high-sensitivity data at up to 30 kV without any compromise

Materials characterization at sub-1 kV

Overview

Ultim Extreme Silicon Drift Detector is a revolutionary solution for ultra-high-resolution FEG-SEM applications and provides better solutions than that offered by traditional micro- and nanoanalysis.

The Ultim Extreme is a windowless 100 mm² version of Ultim intended to increase spatial resolution and sensitivity. It employs a radical geometry to optimize imaging as well as EDS performance in ultra-high-resolution FEG-SEMs while working at short working distance and low kV. With the use of Ultim Extreme, EDS resolution reaches that of the SEM.

Features

Best spatial resolution for SEM-EDS

Sub-10 nm element characterization in the FEG-SEM

Most accurate and fastest nano-characterization

Fast collection, real-time data processing from a bulk sample

Surface science sensitivity

Characterize surfaces in the SEM

Maximum light element sensitivity

New detectability levels for elements such as nitrogen, lithium and oxygen

Differentiation of materials at the lowest kV

Materials characterization of down to 1 kV