UHV FIB-SEM NanoSpace: Ultra-High Vacuum for Ultimate Performances

The NanoSpace UHV FIB-SEM from TESCAN is a versatile, easy-to-use system specifically designed to function under ultra-high vacuum (UHV) conditions.

Users can configure the NanoSpace system either as a scanning electron microscope (SEM) or as a dual-beam platform that incorporates an SEM and a high performance focused ion beam (FIB).

Featuring a modular design, the UHV system allows an array of SEM and FIB columns that match the specific goals and needs of end-users. The system also offers a comprehensive, optimaland customized solution for surface analysis and for FIB nano-machining on samples that need the most rigorous contamination-free environment.

Besides this, the NanoSpace system can be fixed to a UHV-compatible gas injection system (GIS) for local metal deposition and selective etching applications.

A UHV intermediate chamber enables in-situ connection to third-party systems, such as MBE clusters and surface analysis instruments. This connectivity expands the application scope of the NanoSpace system.

Key Benefits

Designed to perform high quality surface analysis

Full UHV design and contamination-free environment

Fully modifiable instrument

High resolution imaging

Accurate control of samples

Fully automated instrument

UHV connection is also available