The Triaxis Sputtering System from Semicore

The Triaxis sputtering system is created and developed by engineering talents at Semicore, a Silicon Valley-based manufacturer. It offers a range of accurate coatings for a range of hybrid substrates and materials used by optical, electronic, solar energy, automotive, medical, aerospace, military and other high-tech industries. The Tri-Axis sputtering system is the first cost-effective open-platform design for precise R & D and small batch production. It offers custom formats and a number of standard options.

Key Features

The key features of the Triaxis sputtering system are:

Vacuum chamber - 304 stainless steel cylindrical chamber, typical size range 18 or 24 inch diameter – scaled to match the specific application

Pumping - turbomolecular or cryogenic

Load lock - manual or automatic transfer, high vacuum pumping. Accommodates small samples of various shapes and sized or a single substrate up to 200 mm diameter.

Process control - PC/PLC-based process automation with graphic user interface, recipe control, data logging and remote e-support

In-situ monitoring and control - quartz crystal monitoring, optical monitoring, residual gas analyzer and other in-situ measurement and process control

Substrate fixture - single, multiple, planetary or custom substrate fixtures

Substrate holders - heated, cooled or biased, rotating substrate holder

Ionsource: substrate pre-cleaning assisted deposition, nanometer-scale modification of surfaces

Tri-Axis deposition techniques - magnetron sputtering, RF, DC, or pulsed-DC, electron beam evaporation, thermal evaporation, organic evaporation for OLED/ PLED and organic electronics, glancing angle deposition (GLAD), Cathodic arc plasma deposition, Pulsed laser deposition (PLD)