The High Performance SC450-LL Sputtering System from Semicore

The SC450-LL sputtering system is a reliable, cost-effective, and high-performance tool. Semicore designs and manufactures precision thin film vacuum deposition systems and products, and its design initiatives and engineering talent contribute effectively to the capabilities, quality, and essential economy of the SC450-LL.

Features

The key features of the high performance SC450-LL sputtering system are as follows:

Advanced fast cycle load-lock

Active Deposition Area up to 200 mm (8”) diameter

Accommodates various substrate shapes/sizes

Small volume, fast cycle processing

Fully automated, integrated controls

Sequential or co-deposition modes

Multiple sources (up to 4)

In-situ cathode tilt

Magnetron sources: 50 mm (2”), 75 mm (3”), or 100 mm (4”)

Substrate table - etch/bias, heating/cooling, rotation

Multiple process gas capability

Confocal cathode arrangement

DC, Pulse DC, RF (HF or MF) power supplies

Integral cathode shutter

R&D prototyping

Facilities Requirements

Process Gases

¼” VCR-4 connection type

138 - 207 kPa (20 - 30 psi.)

99.999% purity semiconductor grade

Up to 3 different gases

Clean Dry Air(Load lock or capacitance manometer option)

620 - 690 kPa (90 - 100 psi.)

¼” Swagelok^® connection type

Nitrogen Vent

¼” Swagelok^® connection type

13 - 207 kPa (2 - 30 psi)

99.999% purity semiconductor grade

Water

½” push fit connection type

7.6 -15 L/min (2.0 - 4.0 gpm)

13 - 27°C (55 - 80°F) water temperature

Distilled water or Propylene Glycol mix

207 kPa (30 psi.) delta min

552 kPa (80 psi.) max inlet pressure

900 W - 2 kW cooling capacity required

Electrical

Single phase

50/60 Hz

208 - 240 VAC

20 - 40 Ω