Pyroglass Limited
PYROGLASS is a company backed by personnel with over 40 years experience in the design, productio……...
The Advanced SC450 Sputtering System for Thin Film Vacuum Deposition Systems
Semicore’s SC450 sputtering system is a reliable, high-performance, cost-effective tool. The company’s engineering talent and design initiatives contribute effectively to the capabilities, quality, and essential economy of the SC450. Semicore designs and manufactures precision thin film vacuum deposition systems and products.
Features
The key features of the advanced SC450 sputtering system are as follows:
Fully automated, integrated controls
Active deposition area up to 200 mm (8”) diameter
Small volume, fast cycle processing
Multiple sources (up to 4)
Accommodates various substrates shape/sizes
Confocal cathode arrangement
Magnetron sources: 50 mm (2”), 75 mm (3”), or 100 mm (4”)
Sequential or co-deposition modes
Multiple process gas capability
DC, Pulse DC, RF (HF or MF) power supplies
Substrate; heating, cooling, RF/DC bias
Integral cathode shutter
In-situ cathode tilt
Advanced FastCycle Load-lock also available
R&D prototyping
Facilities Requirements
Process Gases
Up to 3 different gases
138 - 207 kPa (20 - 30 psi.)
¼” VCR-4 connection type
99.999% purity semiconductor grade
Clean Dry Air (Load lock or capacitance manometer option)
620 - 690 kPa (90 - 100 psi.)
¼” Swagelok® connection type
Nitrogen Vent
13 - 207 kPa (2 - 30 psi)
¼” Swagelok® connection type
99.999% purity semiconductor grade
Water
½” push fit connection type
13 - 27°C (55 - 80°F) water temperature
7.6 - 15 L/min (2.0 - 4.0 gpm)
207 kPa (30 psi.) delta min
552 kPa (80 psi.) max inlet pressure
Distilled water or Propylene Glycol mix
900 W - 2 kW cooling capacity required
Electrical
208 - 240 VAC
20 - 40 Ω
50/60 Hz
Single Phase
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