SC 1500 Inline Sputtering System from Semicore

The SC 1500 inline sputtering system offers an economic, modular and scalable design to meet the requirements of high-volume or pilot production. Load locks with multiple pallet handling for continuous tip to tail processing helps in target utilization and optimal throughput.

Key Features

The key features of the SC1500 inline sputtering system are:

It is possible to use a number of size and shape substrates without costly retooling

Linear magnetron cathodes are offered for single or dual sided sputter deposition

RF, DC, pulse DC sputtering capability

Reactive sputtering is possible

RF substrate etch / pre-cleaning

Cryogenic or turbo high vacuum pump packages

HMI “Human Machine Interface” includes recipe control, data logging, historical trending, tolerance checking, user level access, SECS/GEM interface