Reproducible and Precise Ion Polishing with the PIPS II System

The precision ion polishing system (PIPS™) II is a ground-breaking advancement of the PIPS ion mill system, which has established the standard for transmission electron microscope (TEM) sample preparation for more than two decades.

The PIPS II system integrates the patented WhisperLok^® system with an X, Y positioning stage to ensure accurate centering of the milling target. A 10 in touch screen is also incorporated by the PIPS II system for easy use and better reproducibility and control of the milling process.

The polishing process is controlled using a the digital zoom microscope in real time. It is also possible to store the color images in DigitalMicrograph^® (DM) software to carry out the reviewing and examining processes when the sample is in the TEM.

Key Features

Digital zoom microscope: Works in real time during the milling process

WhisperLok with X, Y stage: Capable of centering the target area for re-polish

LN2 specimen cooling: Removes artifacts

Color image storage in DM software: Capable of storing and utilizing optical images containing the TEM and EELS data in the same format

Variable energy from 0.1 to 8.0 kV: Enhanced low energy milling to obtain reduction in amorphous layer for rectified TEMs

10 inch color touch screen control: Simple but total control from the graphical user interface (GUI)

Low energy focusing penning ion guns: Enhanced low energy milling for focused ion beam (FIB) prepared samples

Applications

Ceramics

Metals (alloy, oxide)

Semiconductor

Download the Brochure for More Information

Specifications

Ion source
Ion guns	Two penning ion guns with low energy focusing electrodes
Milling angle (°)	+10 to -10Each gun independently adjustable
Ion beam energy (kV)	0.1 – 8.0
Ion current density peak (A/ cm²)	10m
Beam alignment	Precision beam alignment using fluorescent screen
Beam diameter	Adjustable using gas flow controller or discharge voltage
Specimen stage
Sample size (mm)	3 or 2.3
MountingStandardOptional	DuoPost^®Graphite holder
Rotation (rpm)	1 – 6
Beam modulation	Single or double with adjustable range
X, Y translation (mm)	±0.5
ViewingOption 1Option 2	Binocular microscopeDigital zoom microscope and DM storage
Vacuum
Dry pumping system	Two stage diaphragm pump backing a 80 L/s turbo drag pump
Pressure (torr)BaseOperating	5 x 10^-68 x 10^-5
Vacuum gauge	Cold cathode type for main chamber, solid-state for backing pump
Specimen airlock	WhisperLok, specimen exchange time <1 min
User interface
10” color touch screen	Simple operation with complete control of all parameters and recipe operation
Dimensions and utilities
Overall size (L x W x H, mm)	547 x 495 x 615
Shipping weight (kg)	45
Power consumption (W)During operationGuns off	200100
Power requirements	Universal 100/240 VAC, 50/60 HzUsers to specify voltage and frequency
Argon gas (psi)	25

Specifications are subject to change.

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