CiS Institut fuer Mikrosensorik GmbH
The CiS Research Institute for Microsensorics GmbH is a privately organized, non-profit, business……...
Reproducible and Precise Ion Polishing with the PIPS II System
The precision ion polishing system (PIPS™) II is a ground-breaking advancement of the PIPS ion mill system, which has established the standard for transmission electron microscope (TEM) sample preparation for more than two decades.
The PIPS II system integrates the patented WhisperLok® system with an X, Y positioning stage to ensure accurate centering of the milling target. A 10 in touch screen is also incorporated by the PIPS II system for easy use and better reproducibility and control of the milling process.
The polishing process is controlled using a the digital zoom microscope in real time. It is also possible to store the color images in DigitalMicrograph® (DM) software to carry out the reviewing and examining processes when the sample is in the TEM.
Key Features
Digital zoom microscope: Works in real time during the milling process
WhisperLok with X, Y stage: Capable of centering the target area for re-polish
LN2 specimen cooling: Removes artifacts
Color image storage in DM software: Capable of storing and utilizing optical images containing the TEM and EELS data in the same format
Variable energy from 0.1 to 8.0 kV: Enhanced low energy milling to obtain reduction in amorphous layer for rectified TEMs
10 inch color touch screen control: Simple but total control from the graphical user interface (GUI)
Low energy focusing penning ion guns: Enhanced low energy milling for focused ion beam (FIB) prepared samples
Applications
Ceramics
Metals (alloy, oxide)
Semiconductor
Download the Brochure for More Information
Specifications
| Ion source | |
|---|---|
| Ion guns | Two penning ion guns with low energy focusing electrodes |
| Milling angle (°) | +10 to -10Each gun independently adjustable |
| Ion beam energy (kV) | 0.1 – 8.0 |
| Ion current density peak (A/ cm2) | 10m |
| Beam alignment | Precision beam alignment using fluorescent screen |
| Beam diameter | Adjustable using gas flow controller or discharge voltage |
| Specimen stage | |
| Sample size (mm) | 3 or 2.3 |
| MountingStandardOptional | DuoPost®Graphite holder |
| Rotation (rpm) | 1 – 6 |
| Beam modulation | Single or double with adjustable range |
| X, Y translation (mm) | ±0.5 |
| ViewingOption 1Option 2 | Binocular microscopeDigital zoom microscope and DM storage |
| Vacuum | |
| Dry pumping system | Two stage diaphragm pump backing a 80 L/s turbo drag pump |
| Pressure (torr)BaseOperating | 5 x 10-68 x 10-5 |
| Vacuum gauge | Cold cathode type for main chamber, solid-state for backing pump |
| Specimen airlock | WhisperLok, specimen exchange time <1 min |
| User interface | |
| 10” color touch screen | Simple operation with complete control of all parameters and recipe operation |
| Dimensions and utilities | |
| Overall size (L x W x H, mm) | 547 x 495 x 615 |
| Shipping weight (kg) | 45 |
| Power consumption (W)During operationGuns off | 200100 |
| Power requirements | Universal 100/240 VAC, 50/60 HzUsers to specify voltage and frequency |
| Argon gas (psi) | 25 |
Specifications are subject to change.
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