PhotoMetrics Inc.

Since 1970, PhotoMetrics has been solving production and failure analysis problems through chemical analysis and materials characterization. We are a commercial analytical laboratory located in Southern California offering state-of-the-art equipment, facilities and instrumentation, including Scanning Auger Microanalysis (SAM), Scanning Electon Microscopy (SEM), Field-Emission SEM for high resolution work, Fourier Transform Infrared Spectroscopy (FTIR), and Atomic Force Microscopy (AFM).

Analytical Capabilities

Microelectronics Failure Analysis - Complete service for construction and failure analysis of semiconductor devices. Obtain accurate line widths, diffusion depths and film thicknesses using precision cross-sectioning and Scanning Electron Microscope imaging.

Micro-contaminant Analysis - Identification of organic and inorganic micro-particles, liquid and solid films.

Surface analysis techniques - for thin film characterization. Analyze the top few molecular layers of your sample with depth profiles to 2000 nm. Identify stains, surface oxidation, metal diffusion, catalyst degradation and measure film thicknesses.

Metallurgical Analysis - Determination of the mode and cause of failure of fractured metals.

Organic and Inorganic Chemical Analysis - Qualitative and quantitative elemental analysis of compounds as solids, liquids and gases. Polymers are identified from a few nanograms of material, elemental analyses require much less.