PANDORA: Lab-Scale Rotary ALD Research Tool

Several scholars actually consider that PANDORA’s box contained something that was much less ominous, which is wishful thinking.

Forge Nano has designed the PANDORA desktop research tool to help unleash the power of atomic layer deposition (ALD). This tool makes particle atomic layer deposition easier, fasterand more cost-effective than any other tool currently available on the market. It brings atomic-level surface engineering to users’ desks.

The PANDORA research tool can be readily operated out of the box and ensures a hassle-free, consistent operation around the clock.

ALD-Enabled Particle Material Equipment

The PANDORA tool has been designed for the following applications:

Catalysts

Energy storage

Corrosion protection

Additive manufacturing

Lubricants

Thermal fillers

Surface engineering

Anti-bacterial and anti-microbial

With numerous configurations and modifiable options, this highly compact tool allows ALD studies in an easily approachable and accessible form factor.

With the PANDORA tool, atomic-level surface engineering is literally at the users’ fingertips. The tool can carry out ALD experimentation for a broad range of applications, from day one onwards. When users are ready, Forge Nano can help them upgrade and industrialize their applications via its unique Commercialization Program.

Basic Specifications and Configurations

Precursors

Compatible with a static or continuous flow

Up to six inlet ports for precursors and gas

Reactor and manifold heating up to 200°C

Zoned precursor source heating (optional)

Substrates

Small objects

Extrudates

Powders (micron-sized or rough and more spherical)

Fibers

Pharmaceutical APIs

Chamber

The maximum batch size is 100 mL

Real-time feedback for temperatures and pressures

D-keyed shaft for rapid exchange of reactors

Impactor for increased mixing (optional)

Chamber inserts for additional mixing (optional)

QCM port (optional)

Automation

Pre-defined recipes for rapid startup

Live data logging

Intuitive interface with a recipe builder

Add-Ons

Zoned precursor source heating up to 200°C

Precursor inlet ports (up to six in total)

Volumetric dosing

Passive impactors

In-situ QCM

Internal lighting and reactor view-port

Plasma

Vacuum Pump

Residual gas analyzer

Complies to cGMP standards

Additional Information

Can be shipped and installed anywhere

Includes 200 to 220 V, 20 A circuit

UL-marked

Users can now access Forge Nano’s Commercialization Services Program that helps with IP protection, commercial vetting, planning, scalability, equipment design, production, manufacturingand more.