ONH836 Series Oxygen/Nitrogen/Hydrogen Analyzer

上海仪舶实验室自动化 25-01-23 17:07:35

ONH836 Series Oxygen/Nitrogen/Hydrogen Analyzer

The ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer is designed by LECO Corporation for measuring the content of nitrogen, oxygen, and hydrogen in ferrous and non-ferrous alloys, inorganic materials, and refractory materials using the inert gas fusion technique.

A custom MS Windows-based software interface is built into the analyzer for carrying out the touch-screen operation. This software is very easy to useand allows the user to access analysis settings, instrument control, reportingand diagnostics.

Key Features

The key features of the ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer are:

Integral Sample Loading Area

Simplifies routine sample drop mechanism maintenance

New quick-change disk filter assembly

Minimizes atmospheric contamination while introducing the sample.

Reliable Automation

Optional 20-crucible batch loader is available

Optional autocleaner removesthe need to manually clean between samples.

Additional Features and Benefits

Compatible with SmartLine Remote Diagnostics

Pressure-compensated and temperature-controlled gas dose system

Boom-mounted touch interface.

Advanced Features

Infrared (IR) and thermal conductivity (TC) detectors

Bypassable OMI-2 carrier gas scrubber for increasing TC cell stability

Triple IR cells are available for detecting oxygen

Patented dyanamic flow compensation further enhances TC cell stability.

Special Purpose Derivatives

H836EN Model

High accuracy analysis of low-level hydrogen in aluminum; titanium, ferrous, and other alloy kinds

Software assistance for stepped temperature furnace profiles assisting the speciation of surface and bulk hydrogen of aluminum

EN sample drop, an upper electrode, and crucibles have been developed to support bigger low-level samples like aluminum slugs or depleted uranium pellets

Substitute for RHEN602 Hydrogen Determinator

O836Si Model

Perfect for oxygen detection in the metals, electronics (high purity copper), and silicon industries(silicon wafers)

Unmatched low-level sensitivity with solid-state infrared detection, novel sample loading, and programmable impulse furnace

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