Diab Group
COMPLETE SANDWICH COMPOSITE SOLUTION With a complete range of high-performance core materials, nu……...
The ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer is designed by LECO Corporation for measuring the content of nitrogen, oxygen, and hydrogen in ferrous and non-ferrous alloys, inorganic materials, and refractory materials using the inert gas fusion technique.
A custom MS Windows-based software interface is built into the analyzer for carrying out the touch-screen operation. This software is very easy to useand allows the user to access analysis settings, instrument control, reportingand diagnostics.
Key Features
The key features of the ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer are:
Integral Sample Loading Area
Simplifies routine sample drop mechanism maintenance
New quick-change disk filter assembly
Minimizes atmospheric contamination while introducing the sample.
Reliable Automation
Optional 20-crucible batch loader is available
Optional autocleaner removesthe need to manually clean between samples.
Additional Features and Benefits
Compatible with SmartLine Remote Diagnostics
Pressure-compensated and temperature-controlled gas dose system
Boom-mounted touch interface.
Advanced Features
Infrared (IR) and thermal conductivity (TC) detectors
Bypassable OMI-2 carrier gas scrubber for increasing TC cell stability
Triple IR cells are available for detecting oxygen
Patented dyanamic flow compensation further enhances TC cell stability.
Special Purpose Derivatives
H836EN Model
High accuracy analysis of low-level hydrogen in aluminum; titanium, ferrous, and other alloy kinds
Software assistance for stepped temperature furnace profiles assisting the speciation of surface and bulk hydrogen of aluminum
EN sample drop, an upper electrode, and crucibles have been developed to support bigger low-level samples like aluminum slugs or depleted uranium pellets
Substitute for RHEN602 Hydrogen Determinator
O836Si Model
Perfect for oxygen detection in the metals, electronics (high purity copper), and silicon industries(silicon wafers)
Unmatched low-level sensitivity with solid-state infrared detection, novel sample loading, and programmable impulse furnace
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