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Magnetron Source for Thin Layers with High Homogeneity: MS2 63C1
The MS2 63C1 Magnetron Source available from PREVAC can be used toapply highly homogenous thin layers in the sputtering process.
The MS2 63C1 Magnetron Source is compatible with UHV conditions. With the integrated in-situ tilt system, it can be utilized in standard as well as custom geometry chambers. The dome-type design also minimizes the space required to open the shutter.
The MS2 63C1 Magnetron Source can be easily used with PREVAC’S M600DC-PS power supply and all other commercially available RF, DC, and pulsed DC power supplies.
Features
Pneumatic dome-type shutter
In situ tilt range: +45° ÷ 10°
Mounting flange: DN 63 CF
Chimney as standard
Targets
Indirectly cooled
Diameter: 2″
Thickness (magnetic): Fe 1 mm, Ni 2 mm, and Co 2–3 mm
Thickness (non-magnetic): 1 to 6 mm
Options
Z manipulator
Mass flow controller (MKS MF1)
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