Layerava PEALD/ALE—A Versatile HCP-ALD System

Layerava from Okyay Tech is an adaptable research device designed for university and industrial research laboratories that use Hollow Cathode Plasma Enhanced Atomic Layer Deposition (HCP-ALD).

Layerava is a PEALD + Thermal ALD platform. In addition to thermal energy, plasma offers an additional energy source for ALD surface reactions. With the addition of different neutral radicals and ion species, the range of available chemistries expands, resulting in denser film deposition.

Image Credit: Okyaytech Ald

The Layerava platform has distinct advantages in growing III-Nitrides (GaN, AlN, InN, BN, TiN, and so on) with ultra-low oxygen contamination in III-Nitride films. The patented large-area hollow cathode plasma (HCP) and sleek reactor design enable the finest quality as-grown III-Nitrides with the lowest reported Oxygen content in literature.

Due to its patented reactor design, Okyay Tech's recipe does not require corrosive gases such as NH₃ for the growth of III-Nitride films, but only common gases such as N2, H2 and Ar. With such a high-efficiency reactor design and the hollow cathode plasma source, polycrystalline III-Nitride films can be grown at temperatures as low as 200 ºC.

Layerava’s distinctive features are also producing incredible results in the growth of metal-oxide layers. The in-situ plasma annealing feature was demonstrated to achieve as-deposited beta-phase Ga₂O₃ at temperatures as low as 200 ºC.

Image Credit: Okyaytech Ald

Specifications

Reactor chamber made of stainless steel

RF power supply and automatic matching network

MFC regulated four plasma process gas lines (N₂, H₂, O₂, Ar)

MKS MFC-controlled carrier gas

Substrate sizes: 100 mm, 200 mm

250 ºC substrate heating (320 ºC optional)

Swagelok high-speed ALD valves (4–8 ports)

Convection-improved Pirani vacuum gauge

Completely automated with recipe control

World-class scientific support team and recipe library

MKS pneumatic isolation valve

Simple graphical user interface

Image Credit: Okyaytech Ald

Customizations

Powder ALD kit with rotating canister, conformal coating of granular substrates

Glovebox integration

Ozone (O₃) process kit, completely recipe-integrated and computer regulated

Low vapor pressure chemical delivery upgrade

Precursor cooling

Dome-lid for 3D objects and non-standard substrates

In-situ QCM thickness monitor

In-situ ellipsometer metrology upgrade

Custom vacuum ports for in-situ RGA and IR spectroscopy

Image Credit: Okyaytech Ald