IMP-EPD: System for Ion Etch Control and Optimum Process Quality from Hiden Analytical

The IMP-EPD is a rugged, differentially pumped, secondary ion mass spectrometer that is designed for analyzing secondary ions from the ion beam etch process.

This system is equipped with integrated software consisting of process specific algorithms specifically designed to provide optimum process control.

The IMP-EPD spectrometer is a proven device for the manufacture of high specification thin film devices for use in several products such as high temperature superconductors, magnetic thin films and III-V semiconductors.

Key Features

The main features of the IMP-EPD include:

Triple filter quadrupole, 300amu mass range is standard

High sensitivity SIMS/MS with pulse ion counting detector

Ion optics with energy analyser and integral ioniser

Differentially pumped manifold with mounting flange to process chamber

Data system with integration to the process tool

Penning gauge and interlocks to provide over pressure protection

Stability with less than ±0.5% height variation over 24h

Programmable DDE, parallel digital I/O, RS232 scripting communication

MASsoft control via RS232, RS485 or Ethernet LAN

Applications

The IMP-EPD finds use in the following applications:

End point analysis

Leak detection

Residual gas analysis

Target impurity determination

Quality control/SPC