Highly Reliable UltraChem® 40 Liquid Particle Counter

上海仪舶实验室自动化 25-01-23 14:00:54

Highly Reliable UltraChem® 40 Liquid Particle Counter

Users require dependable contamination monitoring for their products and the ability to detect particles at an incredibly small scale. Now, they can have both — achieving sensitivity to 40 nm particles while benefiting from the highest level of reliability currently available in the market.

UltraChem® 40 is ideal if the application calls for measuring small particles in chemicals with high molecular scatter.

By using NanoVision Technology®, the light scattered by particles and fluid molecules no longer competes with one another, thus enabling accurate 40 nm sizing for the very first time.

Concerns about background noise and false counts are now a thing of the past, as the groundbreaking NanoVision Technology ensures that only data matching a particle’s unique fingerprint is counted. The outcome- Data that users can confidently rely on for their decision-making.

Benefits

Detect Small Particles

Sensitivity at the 40 nm level.

Increased sample volume to enhance data quality.

NanoVision Technology®

Adaptive technology makes the instrument immune to most optical contamination.

Visualize the particles detected by users’ particle counter.

Capable of measuring small particles within a diverse range of chemicals, including fluids with high molecular scattering. These chemicals encompass:

PGMEA

Sulfuric acid

HF

Photoresist solvents

Low Cost of Operation

Utilizes a solid-state laser diode.

A 3-year warranty covers the Liquid Particle Counter, while a 1-year warranty backs the Electronic Flow Controller.

Features a straightforward and uncomplicated design.

Versatile

Supports numerous communication protocols.

Offers both online and batch sampling options.

The compact design enables flexible placement in various locations.

Applications

Monitoring of deionized water (at both cold and hot temperatures).

Ensuring chemical quality.

Supervision of chemical distribution.

Immersion lithography.

Specifications

Source: Particle Measuring Systems

. .
Size range 40 – 125 nm
Size channels 40, 70, 100, 125 nm
Flow rate 5 ml/min
Sample volume 2 ml/min nominal
Maximum concentration 2,500 particles/ml, Monitor and Spectrometer mode15,000 particles /ml, High-Scatter mode
Sample temperature 50 – 302 °F (10 – 150 °C)
Zero count < 20 counts/l
Laser source Laser diodeClass I, complies with US 21 CFR 1040.10 and EN 60825-1;Internally an enclosed Class 4 laser is used per EN 60825-1
Wetted surface materials Sapphire, Teflon®, Kel-F®
Dimensions (d, w, h) 17.5 x 18.75 x 11.75 in (68.9 x 47.6 x 29.8 cm)
Weight 35 lb (16 kg)
Power 100 – 240 VAC 1.25 Amp
Communications Ethernet (PMS protocol)4-20 mARS-232 (for set up only)
Calibration Materials used are traceable to National Institute of Standards and Technology (NIST) and/or Japanese Industrial Standards (JIS)
Environment Temperature: 50 – 95 °F (10 – 35 °C)Humidity: Non-condensingIndoor use onlyPollution degree 2Over-voltages (transients) Category IIOrdinary protection (not protected against harmful ingress of moisture)Class I equipment (Electrical earth ground from the mains power source to the product input is required for safety)
Warranty 3-year
Electronic Flow Controller
Range 2 – 20 ml/min
Accuracy ± 10%
Control 0 – 10 VDC (supplied by sensor)
Fluid temperature 50 – 176 °F (10 – 80 °C)
Fluid pressure 70 psi, maximum
Wetted materials PFA/PTFE
Communications RS-232 (maintenance functions only)
Operating principle Ultrasonic flowmeter with active PID needle valve control
Warranty 1-year
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