Hiden Analytical’s EQP: Analysis of Positive and Negative Ions, Neutrals and Radicals from Plasma Processes

The EQP instrument is a combined mass spectrometer and energy analyser that is used for the testing neutrals, neutral radicals and plasma ions.

It has operating modes for positive ion and negative ion analysis. Electron attachment ionisation and threshold ionisation modes are provided to enable detailed neutral radical analysis and for analysis of both electro-positive and electro-negative plasma radicals.

The EQP instrument also consists of integrated multi-channel scalar data acquisition with time resolution to 50ns, which enables rapid data acquisition for pulsed plasma applications.

Hiden plasma probes are present to measure certain essential plasma parameters and provide detailed data regarding plasma reaction chemistry.

The integral electron bombardment ion source assists in the analysis of neutrals as well as with the addition of the EAMS (electron attachment mass spectrometry) electron attachment mode, to achieve separation and identification of electronegative radical species.

Key Features

The main features of the EQP system are mentioned below:

Software-controlled ion extraction optics for minimum plasma perturbation

Minimal perturbation of ion flight path and constant ion transmission at all energies

45° electrostatic sector analyser, scans energy at 0.05 eV increments/ 0.25eV FWHM

Tuneable integral ioniser for appearance potential MS with electron attachment option

Differentially pumped triple filter quadrupole, mass range options to 2500amu

High sensitivity / stability pulse ion counting detector with seven decade dynamic range

Penning gauge and interlocks to provide over pressure protection

Signal gating and programmable signal gating option for time resolved studies in pulsed plasma

1000eV option, floating option up to 10keV, Faraday cup for high density plasmas

MASsoft control via RS232, RS485 or Ethernet LAN

Mu-Metal, radio-metal shielding options, high pressure operation option

Applications

The EQP system is used in the following areas:

Laser ablation

Ion implantation

Etching or deposition studies

Analysis of ions and radicals

Residual gas analysis

Plasma electrode coupling

Leak detection