[db:国别翻译]澳大利亚
ANSTO是澳大利亚最大的公共研究机构之一,负责管理我国许多重要的科学基础设施,包括OPAL核研究反应堆……...

TheFilmetrics® R50 benchtop sheet resistance mapping tool represents over 45 years of technical innovation from Filmetrics and KLA Instruments™. The R50 can be configured as either a contact four-point probe (4PP) or non-contact eddy current (EC) probe mapper of sheet resistance, resistivity, thin film and metal film thickness, substrate resistivity, and backside layer thickness.
The R50 configuration is typically determined for a specific set of applications. The R50-4PP configuration is recommended for thinner metal and ion implant processes, and the R50-EC configuration is recommended for measuring thicker metal layers and sensitive or flexible surfaces. These configurations are both available in 100mm and 200mm versions (R50-200-4PP and R50-200-EC) to accommodate larger samples.
Typical samples mapped by the R50 include:
Semiconductor, compound semiconductor and glass substrates
Solar cell and flat panel display (FPD) layers
Metal foils and coatings
PCB patterned layers
Flexible substrates
Wearable materials, such as conductive fabrics
Coated optical prisms, and custom shapes requiring large sample height clearance
The R50 hardware platform shares the familiar Filmetrics Profilm3D design and software interface, with the Filmetrics RsMapper software specialized for resistivity measurements. Key features of the R50 include:
100mm sample Z range with coarse and precision height control and approach
Sheet resistance measurement spans a ten-decade range on conductive and semi-conductive films
User-specified sample point mapping using rectangular, linear, polar, and custom configurations
High precision X-Y stage provides travel up to 200 mm
Easy-to-use software interface

2μm Al layer thickness map from the Filmetrics R50.Image Credit:KLA Instruments™
ANSTO是澳大利亚最大的公共研究机构之一,负责管理我国许多重要的科学基础设施,包括OPAL核研究反应堆……...
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