Evactron ES De-Contaminator: Vacuum Chamber Cleaning System for TESCAN SEM/FIB

Evactron has launched an ES De-Contaminator, which is a compact yet simplified plasma cleaner that delivers high performance. It has been developed specifically for Tescan Ion and Electron Beam Instruments, such as SEMs and FIBs.

The Evactron ES De-Contaminator can be cleaned in a simple way, thereby offering higher contrast imaging and resolution while enhancing the sensitivity of detectors and probes that are otherwise impacted by contamination.

The design of the Evactron ES Plasma Radical Source is compact, making it a universal solution for load locks, sample preparation chambers, or FIB/SEM chambers. The Evactron ES Plasma Cleaner offers quick, mildand effective cleaning throughout a wide range of pressures, thereby enabling artifact-free, high quality images as well as enhanced efficiency of sample analysis.

System Features

Energy-efficient radiofrequency hollow cathode plasma is available

RF power ranges from 10 to 20 W at 13.56 MHz

The Tescan GUI offers cleaning time and programmable power

Dual-action cleaning possible via plasma and UV afterglow

A wide range pressure operation—133 Pa to 3 Pa or 1 Torr to 22 mTorr

High vacuum 'pop'ignition available

Compliant with TMP and does not need advance venting

Guarantees quick cleaning that is over 60 times faster compared to the early generation of Evactron versions

Push-button cleaning operation can be done

Vacuum-safety interlock and external interlock connection (optional) is available

Sensitive components are prevented from being damaged as there is no sputter etch

PRS can be fixed on the SEM chamber or the load lock

Complies with TUV, NRTL, SEMI, RoHSand CE standards

Match or gas flow alterations are not needed for plasma ignition

The Evactron ES Plasma De-Contaminator was designed particularly for OEM integration for high vacuum, SEM, FIBand other analytical systems. The simplified Evactron Plasma Radical Source (PRS) has a compact footprint and makes use of air plasma afterglow to reduce hydrocarbon contamination, thereby offering quick and efficient results.

Specifications of Evactron ES System

Compact Plasma Radical Source (PRS) is available

Consists of 2U rack-mount controller for system integration

Hardware interlock (optional)

SEM/FIB host-directed control

RF power—10 to 20 W at 13.56 MHz CCP

Complies with TUV, NRTL, SEMI, RoHSand CE standards

100 to 240 VAC and 50/60 Hz input