[db:国别翻译]美国Kadco陶瓷
/9-9-I-9M-9M-9-9A-9-9G-9G-9E-1/ Kadco Ceramics专门从事钻石加工和铣削。 该公司致力于将硬材料的精……...
Evactron has launched an ES De-Contaminator, which is a compact yet simplified plasma cleaner that delivers high performance. It has been developed specifically for Tescan Ion and Electron Beam Instruments, such as SEMs and FIBs.
The Evactron ES De-Contaminator can be cleaned in a simple way, thereby offering higher contrast imaging and resolution while enhancing the sensitivity of detectors and probes that are otherwise impacted by contamination.
The design of the Evactron ES Plasma Radical Source is compact, making it a universal solution for load locks, sample preparation chambers, or FIB/SEM chambers. The Evactron ES Plasma Cleaner offers quick, mildand effective cleaning throughout a wide range of pressures, thereby enabling artifact-free, high quality images as well as enhanced efficiency of sample analysis.
System Features
Energy-efficient radiofrequency hollow cathode plasma is available
RF power ranges from 10 to 20 W at 13.56 MHz
The Tescan GUI offers cleaning time and programmable power
Dual-action cleaning possible via plasma and UV afterglow
A wide range pressure operation—133 Pa to 3 Pa or 1 Torr to 22 mTorr
High vacuum 'pop'ignition available
Compliant with TMP and does not need advance venting
Guarantees quick cleaning that is over 60 times faster compared to the early generation of Evactron versions
Push-button cleaning operation can be done
Vacuum-safety interlock and external interlock connection (optional) is available
Sensitive components are prevented from being damaged as there is no sputter etch
PRS can be fixed on the SEM chamber or the load lock
Complies with TUV, NRTL, SEMI, RoHSand CE standards
Match or gas flow alterations are not needed for plasma ignition
The Evactron ES Plasma De-Contaminator was designed particularly for OEM integration for high vacuum, SEM, FIBand other analytical systems. The simplified Evactron Plasma Radical Source (PRS) has a compact footprint and makes use of air plasma afterglow to reduce hydrocarbon contamination, thereby offering quick and efficient results.
Specifications of Evactron ES System
Compact Plasma Radical Source (PRS) is available
Consists of 2U rack-mount controller for system integration
Hardware interlock (optional)
SEM/FIB host-directed control
RF power—10 to 20 W at 13.56 MHz CCP
Complies with TUV, NRTL, SEMI, RoHSand CE standards
100 to 240 VAC and 50/60 Hz input
/9-9-I-9M-9M-9-9A-9-9G-9G-9E-1/ Kadco Ceramics专门从事钻石加工和铣削。 该公司致力于将硬材料的精……...
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