UC San Diego
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The Evactron E50 De-Contaminators are compact, high performance, yet simplified plasma cleaners specifically developed for ion and electron beam instruments, such as SEMs, TEMsand FIBs.
The E50 De-Contaminator allows high power cleaning for outstanding imaging and resolution and provides enhanced probe and detector sensitivity that is normally impacted by contamination.
The Evactron E50 Plasma Radical Source (PRS) features a small-sized design, making it a universal solution for sample preparation chambers, either SEM or FIB chambers, or load locks.
The Evactron E50 De-Contaminator offers quick, robustand effective cleaning over a wide range of pressures, thereby enabling artifact-free, high quality images, as well as enhanced sample analysis efficiency.
System Features
Plasma and UV afterglow enable dual-action cleaning
Energy-efficient radiofrequency hollow cathode plasma (RFHC) available
Bluetooth Android tablet or wired touchpad programming
RF power—75 W peak, up to 50 W continuous
Offered with recipes, programmable power, cleaning timeand number of cycles
TMP-compatible and advance venting is not required
High-vacuum 'pop'ignition available
PRS can be mounted on the load lock or the SEM chamber
Push button cleaning operation available
Enables quick cleaning that is over 100 times quicker compared to the early generation of Evactron models
External interlock connection (optional) is available
Complies with CE, TUV, SEMIand NRTL standards
A wide range of pressure operations—ranges from 0.3 Pa/2 mTorr to 80 Pa/600 mTorr
Does not harm sensitive components—no sputter etch
Match or gas flow changes are not needed for plasma ignition
Evactron E50
The Evactron E50 plasma De-Contaminator has been combined with wireless tablet programming and has been designed to remove hydrocarbon contamination from high vacuum chambers, such as SEMs and FIBs.
The Evactron E50 Plasma De-Contaminator’s compact design houses majority of the models of load-locks and SEM and FIB chambers. The Evactron E50 makes use of air plasma and UV afterglow to rapidly decrease hydrocarbon contamination.
Specifications of Evactron E50 System
Availability of Android tablet or Bluetooth communication package
RF power—35 to 75 W at 13.56 MHz RFHC
Comes with a hardware interlock
Desktop controller fitted with push-button operation
RoHS-compliant
Provides 100 to 240 VAC 50/60 Hz input
Chassis dimensions—width × height × depth = 17.2″ × 3.5″ × 8.6″ (44 × 8.9 × 22 cm)
Evactron E50 E-TC
The Evactron E50 E-TC Plasma De-Contaminator has been particularly designed for facilities that need a wired touchpad interface for programming purposes.
The touchpad, which measures 134 × 112 × 69 mm, is linked to the controller via an RS-232 cable. The simplified PRS has a compact footprint and makes use of air plasma and UV afterglow to remove hydrocarbon contamination, and hence provides immediate results.
Specifications of Evactron E50 E-TC System
Desktop controller provided with pushbutton operation
Hardware interlock is available
Chassis dimensions—width × height × depth: 17.2″ × 3.5″ × 8.6″ (44 × 8.9 × 22 cm)
Comes with tethered touchpad communication package
RF power—35 to 75 W at 13.56 MHz RFHC
100 to 240 VAC 50/60 Hz input
Plasma chemical etch plus UV active desorption
External hollow cathode plasma radical source
No sputter etch damage or debris
Easy to use sample and chamber cleaning
Plasma strikes at high vacuum, no venting required
Image Credit: Evactron (XEI Scientific)
Plasma cleaning of the sample prior to TKD experiments affords many advantages. The improvement in pattern quality and enhanced measurement efficiency is needed for extended experiments, which can include fast and multiple scans at the same sample position (e.g., for repeated in-situ heating or straining experiments). The advantage of plasma cleaning is recommended for all high resolution TKD experiments. Plasma cleaning the sample inside the microscope chamber is recommended since the chamber, detectors and the holder are cleaned simultaneously.
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