CATLAB: Catalyst Characterization, Kinetic and Thermodynamic Measurements System
The Hiden CATLAB is a bench-top microreactor and combined mass spectrometer system. It has been d……...
CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD
Chemical Vapor Deposition (CVD) and PECVD tools are available to grow 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) provides high-performance growth of nanomaterials with in-situ catalyst activation and strict process control, with adaptable temperatures up to 1200 °C.
Image Credit: Oxford Instruments Plasma Technology
Image Credit: Oxford Instruments Plasma Technology
Features
Options of a 700 °C, 800 °C, or 1200 °C table
Outstanding uniformity with flexible temperatures up to 1200 °C
Vacuum load lock—Rapid sample exchange
Optional liquid or solid source delivery system for growth of MoSe2, MoS2, and other TMDCs
Sample size ranges up to 200 mm
Cold wall design available with showerhead-based even precursor delivery
Applications
MoS2 growth
2D materials growth
hBN growth
Carbon nanotube (CNT) growth
1D materials growth
Graphene growth
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