CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD

Chemical Vapor Deposition (CVD) and PECVD tools are available to grow 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) provides high-performance growth of nanomaterials with in-situ catalyst activation and strict process control, with adaptable temperatures up to 1200 °C.

Image Credit: Oxford Instruments Plasma Technology

Image Credit: Oxford Instruments Plasma Technology

Features

Options of a 700 °C, 800 °C, or 1200 °C table

Outstanding uniformity with flexible temperatures up to 1200 °C

Vacuum load lock—Rapid sample exchange

Optional liquid or solid source delivery system for growth of MoSe_2, MoS₂, and other TMDCs

Sample size ranges up to 200 mm

Cold wall design available with showerhead-based even precursor delivery

Applications

MoS₂ growth

2D materials growth

hBN growth

Carbon nanotube (CNT) growth

1D materials growth

Graphene growth