CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD

上海仪舶实验室自动化 25-01-23 16:05:58

CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD

Chemical Vapor Deposition (CVD) and PECVD tools are available to grow 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) provides high-performance growth of nanomaterials with in-situ catalyst activation and strict process control, with adaptable temperatures up to 1200 °C.

CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD

Image Credit: Oxford Instruments Plasma Technology

CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD

Image Credit: Oxford Instruments Plasma Technology

Features

Options of a 700 °C, 800 °C, or 1200 °C table

Outstanding uniformity with flexible temperatures up to 1200 °C

Vacuum load lock—Rapid sample exchange

Optional liquid or solid source delivery system for growth of MoSe2, MoS2, and other TMDCs

Sample size ranges up to 200 mm

Cold wall design available with showerhead-based even precursor delivery

Applications

MoS2 growth

2D materials growth

hBN growth

Carbon nanotube (CNT) growth

1D materials growth

Graphene growth

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