MV one - Mooney Viscometer
The MV one Mooney Viscometer combines the latest measurement technology for the standard Mooney v……...
Crestec Corporation Ltd.
EB lithography systems for nanofabrication.There is less forwardscatter of EB resist due to higher acceleration voltage.CABL-UH model has more accuracy less than 10nm. You can select 90kV, 110kV or 130kV due to your budget.Beam diameter: <1.6 nmΦAccerelation Voltage: 130 kV, 110 kV or 90 kVStage size: 8 inch wafer (you can use any other wafers less than 8 inch wafer)
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