MILLENNIUM SILVER CORP.
Millennium Silver Corp. is focused on the acquisition, exploration and development of precious me……...
The CLS-700 T corrosive liquid sampler is a compression sampler coupled with a LiQuilaz® particle counter for efficient measurementof particles in fluids contained in unpressurized containers.
It is perfect for testing effervescent compounds. The system removes bubbles by pressurizing the sample and forcing the bubblesinto the solution.
The CLS-700 T corrosive liquid sampler can be positionedon a cart for greater mobility or integrated into a wet bench for consistentparticle monitoring.
When incorporated into the wet bench, the sample system can be stopped and started by the tool. This includes automatic shut-off during a bath changeto avoid the injection ofair or chemical foam into the particle counter.
The CLS-700 T corrosive liquid sampler satisfies the requirements set out by SEMI C1 for process chemical particle measurement.
Benefits
Versatility
Accommodates a large variety of fluids and applications
Particle-size thresholds that are programmable
Designed for easy mobility
Compression sampling enables the instrument to measure most chemicals, even effervescent ones
Sampling with process events is coordinated by an external trigger
Measurements can be made out of the bath directly
User-Friendly
Online sampling is made easier using Facility Net process control software, which provides alphanumeric paging, sensor status, tabular and SPC charts, and time plots
SamplerSight batch sampling software facilitates data management, including advanced data storage, retrieval, and report generation
Made for rapid clean-up when changing from one liquid to another
Cost Reduction
A 100 % view volume meansa speedier process qualification
Real-time characterization and analysis for rapid response to anomalies means a reduced waste
Applications
Chemical process control
Bath monitoring
Particle level measurement in effervescent liquids
Wet process monitoring
Specifications
Source: Particle Measuring Systems
. | . | . | . |
---|---|---|---|
Burette volume | 65 ml nominal | ||
Assessed volume | 48 ml nominal | ||
Maximum compression pressure | 60 psi at 120 °C or less; max. 45 psi at 150 °C | ||
Exterior surface | Polypropylene (Meets flame retardant specification FM4910.) | ||
Wetted surface materials | Kalrez® 4079, Teflon®, Kel-F® (See LiQuilaz particle counter information for other wetted surfaces) | ||
Sample temperature | 10 – 150 °C at 45 psi or less (max. 120 °C at 60 psi); Sulfuric acid 100 °C max. | ||
Zero count | <1 count/ml | ||
Dimensions (l, w, h) | 16 x 10 x 16 in (41 x 26 x 39 cm) | ||
Weight | 34 lb (15.5 kg) | ||
Communications | RS-232 or RS-485 | ||
Environment | Temperature: 10 – 35 °C; Humidity: non-condensing | ||
Software | SamplerSight, Facility Net | ||
Sampling | Optionally controlled via an external trigger | ||
Factory requirements | Power: See sensor requirements. Gas pressure: 70 – 150 psi. Liquid connections: Flaretek® 1/4 in. | ||
LiQuilaz S02 | LiQuilaz S03 | LiQuilaz S05 | |
Size range | 0.2 – 2.0 μm | 0.3 – 3.0 μm | 0.5 – 20.0 μm |
Channels | 15 | ||
Flow rate (ml/min) | 50 ml/min ± 10 % | 80 ml/min ± 10 % | 80 ml/min ± 10% |
Sample volume | Volumetric 50ml/min (100 %) | Volumetric 80ml/min (100 %) | Volumetric 80ml/min (100 %) |
Maximum concentration* | 10,000 particles/ml | ||
Sample temperature | 10 – 150 °C (max. 150 °C at 45 psi, 120 °C at 60 psi); Sulfuric acid 100 °C max. | ||
Maximum pressure | 100 psi | ||
Wetted surface materials | Sapphire, Teflon®, Kel-F®, Kalrez®4079 | ||
Laser source | Laser diode | ||
Dimensions (l, w, h) | 13 x 4 x 5 in (32 x 11 x 11 cm); located inside the CLS-700 T | ||
Weight | 6 lb (2.7 kg) | ||
Power | 85 – 132 V or 220 – 240 V,50 – 60 Hz | 85 – 250 V,50 – 60 Hz | 85 – 250 V,50 – 60 Hz |
Communications | RS-485 | ||
Calibration | Materials used are traceable to USA National Institute of Standards and Technology (NIST) and/or Japanese Institute of Standards (JIS). |
*Greater than 90 % accuracy (less than 10 % coincidence loss) at maximum recommended concentration.
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