Canyon Materials, Inc.

Canyon Materials, Inc. specializes in the fabrication of High Energy Beam Sensitive (HEBS) glass photomasks for use in gray scale photolithography to produce 3-D microstructures. HEBS Glass gray scale photomasks are TRUE gray scale photomasks (NOT halftone masks). Customers' designed gray scale pattern having up to more than 500 gray levels is written with an E-beam pattern generator. The image is written within a surface glass layer, 1 micron thick, i.e. no coating of any kind. Optical density values are pre-determined by assigning an electron dosage to each of the many gray levels. HEBS glass is a CMI patented glass product. HEBS-glass gray scale photomasks enable mass fabrication of 3-D microstructures including refractive microlens arrays, diffractive optical elements (DOEs), holographic devices, tapered structures for microelectonic and micromechanical devices, beam shaping elements, as well as optical interconnection in VLSI computing, and micro-optical imaging between smart pixel arrays; arrays of smart pixels being the input/output devices to electronics.