Annealsys

Annealsys designs and manufactures Rapid Thermal Processing / Rapid Thermal Annealing (RTP/RTA) and Chemical Vapor Deposition (DLI CVD, DLI ALD, MOCVD and RTCVD) systems for research laboratories and companies for semiconductor, MEMS, LEDs, sensors, nanotechnologies and photovoltaic applications.

RTP applications include:

Ohmic contact annealing, implant annealing

Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN)

Silicon smoothening

SiC oxidation, silicon carbonization

Diffusion, densification and crystallization

Selenization, Sulfurization

RTCVD of graphene and hexagonal boron nitride

RT-ALD of Al2O3, ZnO, etc.

Annealsys provides Direct Liquid Injection (DLI) CVD and ALD systems offering the highest process versatility for development of new materials by utilization of low vapor and thermally unstable precursors. Our DLI-CVD systems can handle most of the materials of the periodic table and offer unique process and material development capabilities.

DLI-CVD / ALD applications include:

Simple and multi-metallic oxides

2D materials: graphene, h-BN and TMDs (MoS₂, WS₂, etc.)

nitrides, metals and alloys.

Primary Activity

Manufacturers of Rapid Thermal Processing (RTP) and Chemical Vapor Deposition (CVD) systems