Topcon Positioning Systems
With 9 billion people expected on the planet by 2030, there's a lot of work to be done. We&#……...
ALD 200L Series from Kurt J. Lesker Company
Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.
Key features:
Viscous flow ALD reactor chamber
Cabnit design allows for large number of reactant inputs
Heated stainless steel chamber with front-port substrate loading
Accommodates 8" diameter substrates
Substrate heating up to 500°C
Heated lines to 200°C
Fully exhausted cabinet with gas interlocks
Recipe driven process control software
Options include: remote plasma; load lock; gas bubbler with closed loop control
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