ALD 200L Series from Kurt J. Lesker Company

Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Key features:

Viscous flow ALD reactor chamber

Cabnit design allows for large number of reactant inputs

Heated stainless steel chamber with front-port substrate loading

Accommodates 8" diameter substrates

Substrate heating up to 500°C

Heated lines to 200°C

Fully exhausted cabinet with gas interlocks

Recipe driven process control software

Options include: remote plasma; load lock; gas bubbler with closed loop control