AirSentry® II Multi-Point System for Molecular Contamination Monitoring

上海仪舶实验室自动化 25-01-23 13:12:42

AirSentry® II Multi-Point System for Molecular Contamination Monitoring

The most sophisticated airborne molecular contamination (AMC) monitor currently on the market is the AirSentry® II Multi-point Monitoring System. It uses responsive and sensitive ion mobility spectrometry to identify and characterize airborne molecular contamination from numerous locations withina cleanroom. The system includes an onboard industrial computer with secure software and communications, as well as a 16- or 30-point manifold sampling system.

Process tools are frequently dispersed throughout numerous levels and large cleanroom spaces and multiple floorsin contemporary cleanroom manufacturing facilities. Most of the air in a cleanroom is circulated by air handlers, which makes it easy for molecular contamination to migrate to undesirable locations and harm process steps that are located farther from the real contamination sources.

The AirSentry II AMC Monitoring System offers acentral and reasonably priced monitoring station that enables quick contamination detection and monitoring sequences that cover a large number of sample points dispersed across a facility. This is a crucial component of a strategic AMC monitoring program.

Benefits

Compact size

Versatile configuration of testing locations

Low cost-per-sample point

Identifies numerous AMC compounds based on user-specified parameters

Programmed monitoring to identify AMC patterns and occurrences

Features

Monitorsup to 30 sample locations

FeaturesAirSentry II ion mobility spectrometry (IMS) sensors that are reliable, sensitive, and repeatable

Detection of low concentrationsof ammonia, chlorides, amines, and acids

Calibrations traceable to the National Institute of Standards and Technology (NIST)

Real-time graphical software

Industrial PC for dependable and sturdy performance in manufacturing settings

Slide-out keyboard and display for a convenientinterface

Applications

Multi-point cleanroom andprocess bay monitoring

Evaluation and measurement ofchemical filter efficiency

Baseline and qualification of AMC levels in new cleanrooms

Characterization of AMC contributionfrom makeup and recirculation air

Specifications

Source: Particle Measuring Systems

. .
Sample point options 16 or 30 Channels
Analyzer options NH3, Amines, Acids, Chlorides
Analyzer ranges 0 - 50 ppbv
Sample tube length (max.) 75 m
Power 120 VAC or 230 VAC
CDA requirements 10 LPM, 40 psig input, < -76 °F (< -60 °C) dew point, no particles > 50 μm, hydrocarbon-free
Vacuum < 33 kPa (absolute)
Weight Depends on analyzer configuration
Dimensions (H x W x L) 46 x 23 x 30 in (117 x 58 x 76 cm)
Communication Ethernet (OPC)

There are three types of AMC pollution monitoring strategies:

    Real-Time

In the most importantlocations, such as photolithography, where even sub-ppb levels of contamination decrease process performance and negatively impact yield, real-time monitors are continuously used.

  1. Near Real-Time

Near real-time monitors consist of amulti-port sampling schemeto sample a large number of locationsregularly (2-3 times each day).

  1. Off-Line

Off-line monitoring is the processof manuallycollecting an air sample over6–24 hours; laboratory examination is conducted afterward, with findings delivered in 7–10 business days.

A potentAMC monitoring process utilizes a combination of thesethree strategies, with a near real-time technique supplying a significant amount of information. To delivermore detailed time-based or composition-based information, the data from the near real-time analyzer frequently initiates the subsequent use of real-time or offline approaches. This allows for reduced monitoring costs since real-time and offline solutions are more expensive per sample point throughout the monitoring period. To summarize,near real-time monitoring via the AirSentry II AMC Monitoring System isthe basis for the building of robust and capable AMC monitoring programs and strategies.

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