Air-Sensitive Sample Protection with CleanMill Broad Ion Beam System

上海仪舶实验室自动化 25-01-23 14:01:01

Air-Sensitive Sample Protection with CleanMill Broad Ion Beam System

An artifact-free surface is frequently necessary for high-quality material observation and characterization, but this can be challenging to accomplish with conventional polishing methods like mechanical polishing or grinding.

For SEM applications in materials science, the Thermo Scientific CleanMill Broad Ion Beam System is the complete ion beam polishing solution. When a flawless surface is needed, it allows for the best imaging and analysis of materials, including beam- and air-sensitive materials.

Thermo Scientific CleanConnect Sample Transfer System and the CleanMill System work together seamlessly to minimize sample handling and facilitate rapid transfer between instruments.

CleanMill Broad Ion Beam System Features

High-Energy Ion Source

With a maximum accelerating voltage of 16 kV, the ultra-high-energy ion source can quickly grind and polish sample surfaces.

Ultra-Fine Surface Polishing

An optional low-energy ion gun can be added to the CleanMill System to finish polishing sample surfaces.

Wide Acceleration Voltage

The system has dedicated optics for ultra-low-voltage polishing from 100 V to 2 kV and can deliver ion energy between 2 kV and 16 kV.

CleanConnect System Compatibility

To view materials in their natural states, securely move samples from the CleanMill System to the microscope chamber using the Thermo Scientific IGST (inert gas sample transfer) Workflow.

Real-Time Monitoring

Monitoring the broad ion beam milling process with the help of the integrated touchscreen and high-resolution camera.

Cryogenic Milling

When working with materials that are highly sensitive to beams, the optional cryo-stage provides LN2 cooling with automatic replenishment.

CleanMill Broad Ion Beam System Specifications

Ion Optics

Ultra-high-energy ion source with continuously and independently adjustable milling energy

2 to 16 kV

Ion beam current range: 20 to 500 μA

Maximum sputter rate: >500 μm/hr

Optional low-energy source

to 2 kV

Ion beam current range: 10 to 80 μA

Automated ion source setup

Imaging System

CMOS high-resolution camera with a fixed 10× optical zoom and a digital zoom that can continuously adjust up to 120× magnification.

Sample Stage

Sample tilt range: 0 to 180° in 0.1° steps

Sample rotation: 360° in-plane rotation

Sample oscillation: ±1° to ±180° in 1° steps

Sample Holders and Maximum Sample Size

Standard surface polishing sample holder

CleanConnect System-compatible sample holders

30 mm (diameter)×15 mm (height)

Surface polishing

Interchangeable holder to allow 20.5 mm (diameter) × 8.5 mm (height)

28 mm (diameter) × 3 mm (height)

Cross-section polishing

90° slope: 10 mm × 10 mm × 3 mm

Vacuum System

Oil-free diaphragm and turbomolecular pumps with Pirani and Penning vacuum gauges

Gas supply: high-purity argon with high-precision gas flow control

Computer Control

User-friendly touchscreen graphical user interface (GUI)

System setup Milling parameter setting

Operation control

Touch GUI with Microsoft Windows 11

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