Best-in-Class Performance AFM with the NanoWizard PURE
The high-end NanoWizard® PURE atomic force microscope from Bruker is a combination of perform……...
An artifact-free surface is frequently necessary for high-quality material observation and characterization, but this can be challenging to accomplish with conventional polishing methods like mechanical polishing or grinding.
For SEM applications in materials science, the Thermo Scientific CleanMill Broad Ion Beam System is the complete ion beam polishing solution. When a flawless surface is needed, it allows for the best imaging and analysis of materials, including beam- and air-sensitive materials.
Thermo Scientific CleanConnect Sample Transfer System and the CleanMill System work together seamlessly to minimize sample handling and facilitate rapid transfer between instruments.
CleanMill Broad Ion Beam System Features
High-Energy Ion Source
With a maximum accelerating voltage of 16 kV, the ultra-high-energy ion source can quickly grind and polish sample surfaces.
Ultra-Fine Surface Polishing
An optional low-energy ion gun can be added to the CleanMill System to finish polishing sample surfaces.
Wide Acceleration Voltage
The system has dedicated optics for ultra-low-voltage polishing from 100 V to 2 kV and can deliver ion energy between 2 kV and 16 kV.
CleanConnect System Compatibility
To view materials in their natural states, securely move samples from the CleanMill System to the microscope chamber using the Thermo Scientific IGST (inert gas sample transfer) Workflow.
Real-Time Monitoring
Monitoring the broad ion beam milling process with the help of the integrated touchscreen and high-resolution camera.
Cryogenic Milling
When working with materials that are highly sensitive to beams, the optional cryo-stage provides LN2 cooling with automatic replenishment.
CleanMill Broad Ion Beam System Specifications
Ion Optics
Ultra-high-energy ion source with continuously and independently adjustable milling energy
2 to 16 kV
Ion beam current range: 20 to 500 μA
Maximum sputter rate: >500 μm/hr
Optional low-energy source
to 2 kV
Ion beam current range: 10 to 80 μA
Automated ion source setup
Imaging System
CMOS high-resolution camera with a fixed 10× optical zoom and a digital zoom that can continuously adjust up to 120× magnification.
Sample Stage
Sample tilt range: 0 to 180° in 0.1° steps
Sample rotation: 360° in-plane rotation
Sample oscillation: ±1° to ±180° in 1° steps
Sample Holders and Maximum Sample Size
Standard surface polishing sample holder
CleanConnect System-compatible sample holders
30 mm (diameter)×15 mm (height)
Surface polishing
Interchangeable holder to allow 20.5 mm (diameter) × 8.5 mm (height)
28 mm (diameter) × 3 mm (height)
Cross-section polishing
90° slope: 10 mm × 10 mm × 3 mm
Vacuum System
Oil-free diaphragm and turbomolecular pumps with Pirani and Penning vacuum gauges
Gas supply: high-purity argon with high-precision gas flow control
Computer Control
User-friendly touchscreen graphical user interface (GUI)
System setup Milling parameter setting
Operation control
Touch GUI with Microsoft Windows 11
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